@InProceedings{BarqueteCoraCampTrav:2008:DiFiCh,
author = "Barquete, D. M. and Corat, Evaldo Jos\é and Campos, R. A. and
Trava-Airoldi, Vladimir Jesus",
affiliation = "{} and {Instituto Nacional de Pesquisas Espaciais (INPE)} and
{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto
Nacional de Pesquisas Espaciais (INPE)}",
title = "Diamond Films Chemical Vapor Deposition on Cemented Carbides Using
Vanadium Carbide Interface",
booktitle = "Anais...",
year = "2008",
organization = "Encontro SBPMat, 7.",
keywords = "diamond film, CVD, interface, vanadium carbide, thermal
diffusion.",
abstract = "WC-Co cemented carbide tools are extensively used in high scale
and high technology products, as in automotive and aerospace
industries, chiefly in machining operations of aluminum parts.
Recently, WC micrograin was developed to increase tool life and
cutting performance. Diamond chemical vapor deposition (CVD) films
is an important process to boost micrograin cemented carbide tools
performance, however its contribution is still limited, due to
unfavorable effects of the cobalt binder and thermal expansion
mismatch. Several solutions to this problem have been proposed and
implemented, but up to now they are not effective to achieve
industrial extensive acceptance. In this work, a thermal reactive
and diffused interface layer of vanadium carbide (VC) has been
applied to improve film quality, adherence of diamond film to
substrate and tool life and cutting performance. Figure 1 shows
the interface transverse section and the 9 {\`{\i}}m thick VC
interlayer. Figure 2 shows the Raman spectroscopy of the diamond
film, that evidences its crystallinity and a compressive stress of
1.05 GPa, corresponding to 3 cm-1 peak shift. Characterization of
the film was realized by Raman spectroscopy, X-ray diffraction,
scanning electron microscopy and indentation tests.",
conference-location = "Guaruj\á, SP",
conference-year = "28 set. - 02 out.",
language = "en",
urlaccessdate = "12 maio 2024"
}